Investigation on SiGe selective epitaxy for source and drain engineering in 22 nm CMOS technology node and beyond
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ShareCopied to clipboardInvestigation on SiGe selective epitaxy for source and drain engineering in 22 nm CMOS technology node and beyond is a book. It was written by Guilei Wang and published by : Springer in 2020.
Key facts
- author: Guilei Wang
- publication date: 2020
- book publisher: : Springer
- book series: Springer theses
- book subjects: Epitaxy, Metal oxide semiconductors, Complementary-Materials
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"Investigation on SiGe selective epitaxy for source and drain engineering in 22 nm CMOS technology node and beyond" is one of the books by Guilei Wang, books by : Springer and 2,617,384 books in our database.
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