Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology
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ShareCopied to clipboardChemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology is a book. It was written by Christopher Lyle Borst and published by Kluwer Academic in 2002.
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- author: Christopher Lyle Borst
- publication date: 2002
- book publisher: Kluwer Academic
- book series: unknown
- book subjects: Grinding and polishing, Interconnects (Integrated circuit technology)
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"Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology" is one of the books by Christopher Lyle Borst, books by Kluwer Academic and 2,617,384 books in our database.
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