Advanced Ta-based diffusion barriers for Cu interconnects
Bookmark
ShareCopied to clipboardAdvanced Ta-based diffusion barriers for Cu interconnects is a book. It was written by René Hübner and published by Nova Science Publishers in 2009.
Key facts
- author: René Hübner
- publication date: 2009
- book publisher: Nova Science Publishers
- book series: unknown
- book subjects: Integrated circuits, Interconnects (Integrated circuit technology), Electrodiffusion
See more factsExtract data
Download datasets about Advanced Ta-based diffusion barriers for Cu interconnects:
Dataset of books series that contain Advanced Ta-based diffusion barriers for Cu interconnects:
Dataset of book subjects that contain Advanced Ta-based diffusion barriers for Cu interconnects:
"Advanced Ta-based diffusion barriers for Cu interconnects" is one of the books by René Hübner, books by Nova Science Publishers and 2,617,384 books in our database.
Related
Connected or similar to Advanced Ta-based diffusion barriers for Cu interconnects: .
This dashboard is based on data from: The British Library.
This content is available under the CC BY 4.0 license.